铁电记忆器的随机性和过程引起的损伤之间的物理相关性
Ryun-Han Koo1, Seungwhan Kim1, Jiseong Im1
1Department of Electrical and Computer Engineering and Inter- University Semiconductor Research Center (ISRC), Seoul National University, Seoul, 08826, Korea.
Nano convergence
|August 29, 2025
概括
喷射等离子电力通过改变陷密度影响铁电道结 (FTJ) 的性能. 优化等离子体条件可以最大限度地降低噪音,提高记忆和神经形态设备的可靠性.
科学领域:
- 材料科学
- 固态物理
- 设备工程
背景情况:
- 基于HfZrO2 (HZO) 的铁电道连接 (FTJ) 对记忆和神经形态应用具有前景.
- 喷等离子过程可能会引入缺陷,影响设备的电气特性.
研究的目的:
- 调查喷射等离子体诱导损伤如何影响基于HZO的FTJ的随机性质.
- 通过控制等离子体诱导的缺陷来优化设备的内存和神经形态应用.
主要方法:
- 使用低频噪声 (LFN) 光谱分析随机特征.
- 进行了温度依赖的电气测量.
- 在顶部电极沉积过程中系统地改变了喷射等离子功率.
主要成果:
- 增加了喷射等离子体的功率,导致HZO层中的陷密度增加.
- 更高的陷密度促进了普尔-弗伦克尔导电和增加了电流噪声量.
- 观察到增强的电流密度和铁电道电阻 (TER) 比率,但随着随机波动的增加.
结论:
- 等离子体工艺条件对FTJ中的陷密度,LFN和设备性能产生重大影响.
- 优化喷射参数可以最大限度地降低随机噪声,同时提高电气性能.
- 这项研究为开发可靠的下一代铁电式记忆和神经形态系统提供了指导方针.
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