使用固态量子传感器测量化CVD钻石中的应力张量
T Tsuji1, S Harada2,3, T Teraji4
1International Center for Young Scientists, National Institute for Materials Science, Tsukuba, Ibaraki, Japan.
Science and technology of advanced materials
|September 8, 2025
概括
使用光学检测磁共振 (ODMR) 测量了化化学蒸汽沉积 (CVD) 钻石薄膜中的残余应力. 兴奋剂诱导了压力压力,导致钻石膜的体积减少.
科学领域:
- 材料科学 材料科学 材料科学
- 固态物理 固态物理
- 钻石技术 钻石技术 钻石技术
背景情况:
- 剩余应力对钻石薄膜的性能和性能产生重大影响.
- 兴奋剂是一种常见的技术,用于修改钻石的电子和光学特性.
- 了解钻石膜中的应力对于电子和光子学中的应用至关重要.
研究的目的:
- 量化化 (001) 化学蒸汽沉积 (CVD) 钻石薄膜中的残余应力张量.
- 为了研究钻石薄膜内的应力分布的空间变化.
- 为了确定兴奋剂对钻石薄膜应力状态和体积的影响.
主要方法:
- 利用空 (NV) 中心的光学检测磁共振 (ODMR) 来测量应力张量组件.
- 使用共聚焦显微镜设置进行空间分辨应力映射.
- 分析了ODMR光谱中的变化,以推断应力值.
主要成果:
- 其余应力张量组件 (σxy, σyz, σzx, σxx+σyy+σzz) 确定为分别大约0.077, -0.39, -0.67和1.52 GPa.
- 在CVD钻石薄膜的增长方向 (z方向) 中确定了显著的剪切应力.
- 观察到压力轴应力 (σxx+σyy+σzz),导致体积减少0.073%.
结论:
- 在CVD钻石薄膜中使用兴奋剂会导致压力应激状态.
- 观察到的压力应力和随后的体积减少归因于的存在.
- 这些发现为高级应用提供了对合钻石薄膜机械行为的关键见解.
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