过渡金属氧化物薄膜的材料生长和特征基于热线氧化升华沉积技术的热线氧化沉积技术
Fengchao Li1,2,3, Qingguo Kang1, Zhenwei Kang1
1School of Semiconductor and Physics, North University of China, Taiyuan 030051, China.
Materials (Basel, Switzerland)
|September 13, 2025
概括
一种新的热线氧化升华沉积 (HWOSD) 方法产生高质量的无形氧化物 (MoOx) 和氧化物 (WOx) 薄膜. 这些过渡金属氧化物薄膜对先进设备具有出色的光电子性能.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 固态物理 固态物理
背景情况:
- 过渡金属氧化物 (TMO) 由于其光电子特性,对光伏和光催化非常重要.
- 对于TMO薄膜而言,现有的制造方法可能是复杂的或能源密集的.
研究的目的:
- 开发一种可扩展的低温方法,用于制造高质量的无形MoOx和WOx膜.
- 描述这些TMO膜的结构,光学和电子特性.
- 评估它们在光电子应用中的性能,特别是作为太阳能电池中的孔传输层 (HTL).
主要方法:
- 热线氧化升华沉积 (HWOSD) 用于从元素来源沉积无形MoOx和WOx薄膜.
- 电影的特征包括扫描电子显微镜 (SEM),原子力显微镜 (AFM),X射线光电子光谱 (XPS),光学传导度测量,导电性测量和少数载体寿命测量.
- 用MoOx和WOx作为HTL来研究光伏性能.
主要成果:
- HWOSD生产了具有高氧含量的均,合规无形MoOx和WOx膜 (立体比率约为2.9).
- 片呈现出高光学传导率 (>94%从400-1200nm) 和合适的频段间隙 (MoOx的1.86 eV,WOx的2.67 eV).
- 导电性和表面电位测量表明电子性能良好,MoOx在Si基堆中提供额外的被动化优势.
结论:
- HWOSD是一种有效的,可扩展的,低温技术,用于制造高质量的无形TMO薄膜.
- 制造的MoOx和WOx膜显示出出色的光电子功能,适合光伏等先进应用.
- 这种方法扩大了TMO在下一代光电子设备中的潜力.
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