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对于四象限风成像干扰仪的无阶段涂层技术

Tingyu Yan1, Luhan Huang1, Yanqiang Wang2

  • 1Key Laboratory of Atmospheric Sounding, College of Electronic Engineering, Chengdu University of Information Technology, Chengdu 610225, China.

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概括
此摘要是机器生成的。

一种新的无级别涂层技术增强了四象限风成像干扰仪,用于精确的风场测量. 这一进步在紧的固态设计中提供了高反射率和改进的相位精度.

关键词:
阶段步骤 阶段步骤无级别的涂层是没有级别的.风成像干扰仪风成像干扰仪

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科学领域:

  • 光学和光子学 在光学和光子学.
  • 计量学 计量学 计量学
  • 薄膜科学科学 薄膜科学

背景情况:

  • 四象限风成像干扰仪使用四相状态测量风场.
  • 现有的系统受益于低光源的灵敏度和紧的设计.
  • 需要取得进展,以提高在固态配置中的精度和适用性.

研究的目的:

  • 为了引入一种新的无步,四象限,分阶段涂层技术.
  • 为了提高所有固态风成像干扰仪的性能.
  • 为了提高反射效率和分阶段精度.

主要方法:

  • 对四象限组件的材料选择和涂层架构进行详细分析.
  • 开发了一种无阶段,分阶段的涂层工艺.
  • 计算机辅助薄膜设计和模拟用于验证.

主要成果:

  • 拟议的技术提供了高反射率.
  • 改善了干扰仪象限的分阶段精度.
  • 通过计算机模拟成功验证.

结论:

  • 无阶段涂层技术是风成像干扰仪的可行增强.
  • 这种方法支持开发更精确,更紧的全固态风力测量系统.
  • 这些发现为先进的光学计量学应用铺平了道路.