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Updated: Jan 17, 2026

Fabrication and Characterization of Superconducting Resonators
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双图案波导共振器与传统的紫外线接触光刻画.

Pei-Hsun Wang, Hung-Yu Chen, Yi Chang

    Applied optics
    |September 22, 2025
    PubMed
    概括
    此摘要是机器生成的。

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    我们开发了一种双模式技术,用于制造光子微振荡器. 这种方法实现了微米以下的差距,改善了质量因素,并提供了具有成本效益的高分辨率集成光学.

    科学领域:

    • 光子学和光学工程的工程.
    • 材料科学和纳米技术

    背景情况:

    • 集成微振解器是光子学中至关重要的组成部分.
    • 传统的光刻法方法在实现先进设备所需的亚微米特征尺寸方面存在局限性.

    研究的目的:

    • 介绍一种用于制造集成微振荡器的新型双模方法.
    • 为了克服传统紫外线接触光刻的分辨率限制,用于光子学.

    主要方法:

    • 使用了传统的紫外线接触式光刻法,采用双重图案方案.
    • 在单一的光电阻旋和蚀刻过程中单独设计的总线和振荡器波导.
    • 波导之间实现了微米以下的间隙,超过了标准光刻画分辨率.

    主要成果:

    • 制造的集成微复原器具有质量 (Q) 因素高达大约10^4.4.
    • 在共振器中达到超过20dB的最大测量灭火比.
    • 证明了实现微米以下距离的能力,这对于密集的光子集成至关重要.

    结论:

    • 拟议的双模组方法使高性能微复原器的简单和低成本制造成为可能.
    • 这种技术在先进的光子学应用中突破了传统光刻的界限.

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  • 为创建具有更好的分辨率和性能的集成光子设备提供了可行的解决方案.