Jove
Visualize
联系我们
JoVE
x logofacebook logolinkedin logoyoutube logo
关于 JoVE
概览领导团队博客JoVE 帮助中心
作者
出版流程编辑委员会范围与政策同行评审常见问题投稿
图书馆员
用户评价订阅访问资源图书馆顾问委员会常见问题
研究
JoVE JournalMethods CollectionsJoVE Encyclopedia of Experiments存档
教育
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab Manual教师资源中心教师网站
使用条款与条件
隐私政策
政策

相关概念视频

您也可能阅读

相关文章

通过共同作者、期刊和引用图与本文相关的文章。

排序
Same author

Comparison study of supercritical water gasification for hydrogen production on a continuous flow versus a batch reactor.

Bioresource technology·2023
Same author

Passive Internet of Events Enabled by Broadly Compatible Self-Powered Visualized Platform Toward Real-Time Surveillance.

Advanced science (Weinheim, Baden-Wurttemberg, Germany)·2023
Same author

Slow-light silicon modulator with 110-GHz bandwidth.

Science advances·2023
Same author

Glycerol-weighted chemical exchange saturation transfer nanoprobes allow <sup>19</sup>F<sup>/1</sup>H dual-modality magnetic resonance imaging-guided cancer radiotherapy.

Nature communications·2023
Same author

Pectic oligosaccharides ameliorate high-fat diet-induced obesity and hepatic steatosis in association with modulating gut microbiota in mice.

Food & function·2023
Same author

The value of ultrasound combined with CT in identifying early low-grade appendiceal mucinous neoplasm and appendicitis.

Frontiers in oncology·2023
Same journal

Denoising algorithm of Φ-OTDR systems based on adaptive fractional wavelet transform denoising.

Optics express·2026
Same journal

Millisecond photon-to-photon latency and high-speed volumetric projection system for optogenetics.

Optics express·2026
Same journal

Polarization-encoded coaxial structured light for high-precision 3D surface profilometry.

Optics express·2026
Same journal

Discrete freeform optical design based on collaborative optimization of point cloud and local normals.

Optics express·2026
Same journal

Ultrafast ghost imaging with 25 GHz speckle switching and wavelength-division multiplexing.

Optics express·2026
Same journal

Atomic vapor cells fabricated by femtosecond laser welding of standard-optical-quality glass.

Optics express·2026
查看所有相关文章

相关实验视频

Updated: Jan 17, 2026

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
09:45

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

Published on: June 12, 2018

10.0K

基于物理引导强化学习框架的反向光刻技术.

Haoyu Wang, Yu Feng, Jiaqi Liu

    Optics express
    |September 23, 2025
    PubMed
    概括
    此摘要是机器生成的。

    本研究介绍了用于逆光刻技术 (ILT) 的强化学习 (RL) 框架,以改善芯片制造. 基于RL的ILT通过整合物理知识来提高计算效率和面具制造能力.

    更多相关视频

    Simple Lithography-Free Single Cell Micropatterning using Laser-Cut Stencils
    08:59

    Simple Lithography-Free Single Cell Micropatterning using Laser-Cut Stencils

    Published on: April 3, 2020

    8.0K
    Control of Cell Geometry through Infrared Laser Assisted Micropatterning
    11:04

    Control of Cell Geometry through Infrared Laser Assisted Micropatterning

    Published on: July 10, 2021

    3.8K

    相关实验视频

    Last Updated: Jan 17, 2026

    Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
    09:45

    Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

    Published on: June 12, 2018

    10.0K
    Simple Lithography-Free Single Cell Micropatterning using Laser-Cut Stencils
    08:59

    Simple Lithography-Free Single Cell Micropatterning using Laser-Cut Stencils

    Published on: April 3, 2020

    8.0K
    Control of Cell Geometry through Infrared Laser Assisted Micropatterning
    11:04

    Control of Cell Geometry through Infrared Laser Assisted Micropatterning

    Published on: July 10, 2021

    3.8K

    科学领域:

    • 半导体制造业 半导体制造业
    • 计算式 lithography 的使用方法.
    • 在工程领域的人工智能.

    背景情况:

    • 逆光刻技术 (ILT) 对于提高光刻系统分辨率和芯片制造产量至关重要.
    • 实际的ILT应用面临着由于计算复杂性和面具制造能力的挑战.
    • 现有的ILT方法需要大量的计算资源,并与面具制造的限制作斗争.

    研究的目的:

    • 提出一种新的ILT框架,利用强化学习 (RL) 来克服计算和可制造性的局限性.
    • 提高ILT在半导体制造中的效率和实际应用.
    • 将物理事先的知识整合到ILT过程中,以改进面具设计.

    主要方法:

    • 开发了一个ILT框架,使用强化学习 (RL) 代理.
    • 综合物理信息通过RL代理和前置光刻模拟之间的相互作用.
    • 使用了从反光刻图梯度图中获得的关键点序列,用于RL代理的作用.
    • 雇佣了曼哈顿的校正单位,以确保面具的制造能力.

    主要成果:

    • 与传统方法相比,基于RL的ILT框架证明了计算效率的提高.
    • 通过结合物理约束来实现更好的口罩制造能力.
    • 模拟结果证实了基于RL的方法在ILT中的优越性.
    • 基于关键点序列的行动策略确保了高效的计算.

    结论:

    • 拟议的基于RL的ILT框架为半导体制造提供了显著的进步.
    • 这种方法有效地解决了ILT中的计算复杂性和掩盖可制造性问题.
    • 强化学习为优化 lithography 过程和提高芯片产量提供了一个强大的工具.