将近一维建模与区域结构分析相结合,用于快速技术计算机辅助设计模拟门周围的MOSFET
Kwang-Woon Lee1, In Ki Kim1, Seung-Woo Jung1
1Department of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Gwangju, Republic of Korea.
Communications engineering
|September 25, 2025
概括
本研究介绍了一种技术计算机辅助设计 (TCAD) 设备模拟的更快方法. 新方法通过快速生成近似解决方案来加速模拟,大大减少了半导体工程师的研发时间.
科学领域:
- 半导体设备物理 半导体设备物理
- 计算电子电子 计算电子
- 材料科学 材料科学 材料科学
背景情况:
- 技术计算机辅助设计 (TCAD) 模拟对于半导体研发至关重要.
- 长时间的模拟时间对工程师来说是一个很大的瓶.
研究的目的:
- 开发一种可靠和高效的方法来加速TCAD设备模拟.
- 为了减少设备模拟所需的计算成本和时间.
主要方法:
- 快速生成近似解决方案以加快模拟.
- 使用准一维模型和区域智能的结构分析.
- 有效地处理一般的三维设备结构.
主要成果:
- 与传统偏差放缓相比,实现了数量级更快的模拟时间.
- 证明了下一代互补场效应晶体管 (CFET) 逆变器和其他结构的10倍至100倍加速.
- 没有额外的计算成本用于加速.
结论:
- 拟议的方法显著加快了TCAD设备模拟.
- 这种方法提供了一个切实可行的解决方案,以减少半导体技术的研发时间.
- 该技术适用于复杂的3D设备结构和先进的晶体管设计.
相关概念视频
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