厚度对热化 (GaIn) 膜的结构和光学性能的影响
Shiyang Zhang1, Fabi Zhang1,2, Tangyou Sun1,2
1Key Laboratory of Microelectronic Devices and Integrated Circuits, Guilin University of Electronic Technology, Guilin 541004, China.
Nanomaterials (Basel, Switzerland)
|September 26, 2025
概括
薄膜厚度显著影响氧化 (GaIn) 2O3薄膜.
科学领域:
- 材料科学 材料科学 材料科学
- 薄膜技术 薄膜技术
- 半导体物理 半导体物理
背景情况:
- 氧化 ((GaIn) 2O3) 是一个有前途的半导体材料.
- 了解薄膜特性对于设备应用至关重要.
- 脉冲激光沉积 (PLD) 是一种用于薄膜生长的多功能技术.
研究的目的:
- 研究薄膜厚度对结构性,形态性和光学性质的影响.
- 探索沉积参数与薄膜质量之间的关系.
- 为了确定所需材料特征的最佳厚度.
主要方法:
- 脉冲激光沉积 (PLD) 在室温下.
- 薄膜厚度从20nm到391nm之间变化.
- 使用原子力显微镜 (AFM) 和X射线衍射 (XRD) 进行表征.
- 光学属性分析,包括带隙测定.
主要成果:
- 由沉积时间控制的薄膜厚度在20至391nm之间.
- 观测到的最佳颗粒大小和XRD强度大约在105nm厚度.
- 带隙能量随着厚度的增加从5.14 eV降至4.55 eV.
- 厚度与结构,形态和光学特性之间存在显著的相关性.
结论:
- 薄膜厚度是一个影响 (GaIn) 2O3薄膜性能的关键参数.
- 脉冲激光沉积增长模式会影响整体的电影质量.
- 优化薄膜厚度对于定制薄膜质量和带隙能量至关重要.
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