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Updated: Jan 16, 2026

Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
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超广场成像 穆勒矩阵光谱圆测量用于半导体计量学

Juntaek Oh1, Jaehyeon Son1, Changhyeong Yoon1

  • 1Advanced Process Development Lab 4, Semiconductor R&D Center, Samsung Electronics Co., Ltd., 1-1 Samsungjeonja-ro, hwaseong-si, Gyeonggi-do, 18848, Republic of Korea.

Nature communications
|September 26, 2025
PubMed
概括

我们开发了一种新的超广场成像穆勒矩阵光谱圆测量系统,用于半导体计量. 这种先进的系统显著提高了数据采集和吞吐量,使精确的缺陷检测能够提高制造产量.

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Spectral and Angle-Resolved Magneto-Optical Characterization of Photonic Nanostructures

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Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used....
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