在AlGaN/GaN高电子流动性晶体管中的双层碳/铁合缓冲器的影响
Po-Hsuan Chang1, Chong-Rong Huang2, Chia-Hao Liu2
1Department of Electronic Engineering, I-Shou University, Kaohsiung 840, Taiwan.
Micromachines
|September 27, 2025
概括
这项研究使用复合碳/铁合缓冲层增强了化 (GaN) 高电子流动性晶体管 (HEMT). 这种双层方法改善了故障电压,并降低了下一代动力设备的电阻.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
- 电气工程 电气工程
背景情况:
- 电力设备中的铁 GaN 受到铁离子扩散和记忆效应的影响.
- 在AlGaN/GaN HEMT中探索碳合的GaN层,以减轻这些问题.
研究的目的:
- 为了比较AlGaN/GaN HEMT与单一碳合 (C合) 缓冲层与复合碳/铁合 (C/Fe合) 缓冲层的性能.
- 为了研究复合材料缓冲器对铁离子扩散和设备特性的影响.
主要方法:
- 用单一C-doped和复合C/Fe-doped缓冲层制造的AlGaN/GaN HEMT.
- 使用直流 (DC) 测量,脉冲测量,低频噪声分析和可变温度分析进行表征.
主要成果:
- 单一的C-doped缓冲器表现出较少的载体捕获/释放缺陷和更好的动态特性.
- 复合C/Fe合缓冲器抑制了Fe的迁移,导致更高的垂直断裂电压和更低的板电阻.
- 复合材料缓冲器显示了进一步调整的潜力,以实现增强的半绝缘行为.
结论:
- 复合材料C/Fe-doped缓冲层提供了一个有前途的策略,以改善在基于GaN的动力设备中的泄漏抑制,陷控制和动态性能之间的权衡.
- 优化的双层缓冲区配置是推动下一代功率电子技术发展的关键.
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