在TID辐射下对n-MOSFET电流镜的电荷捕获效应
Dorsaf Aguir1, Sedki Amor1,2, Laurent A Francis2
1Laboratory of Electronics and Microelectronics (LEMM), University of Monastir, Monastir 5019, Tunisia.
Micromachines
|September 27, 2025
概括
总电离剂量 (TID) 辐射显著降解n-MOSFET电流镜. 电荷捕获导致值电压变化和输出精度降低,这对于辐射硬化设计至关重要.
科学领域:
- 半导体物理 半导体物理
- 辐射对电子产品的影响
- 集成电路可靠性 集成电路可靠性
背景情况:
- n-MOSFET电流镜是模拟电路中必不可少的部件.
- 了解辐射诱导的退化对于在恶劣环境中可靠的电子系统至关重要.
研究的目的:
- 为了评估总电离剂量 (TID) 辐射对n-MOSFET电流镜表现的影响.
- 为了分析电荷捕获和TID曝光下的电流镜像退化之间的关系.
主要方法:
- 使用60Co马源,将n-MOSFET电流反射镜置于50至300krad (Si) 的TID剂量中.
- 采用实验方法来测量值电压转移和透导变化.
- 量化当前镜像输出精度的减少.
主要成果:
- 观察到的门电压转移到1.31V.
- 测量过导率增加了高达27%.
- 在最高的TID剂量下报告了当前镜像输出精度>10%的减少.
结论:
- 在n-MOSFET电流反射镜中,TID辐射会导致性能降低,主要是由于电荷在门氧化物和Si-SiO2接口中被捕获.
- 该研究提供了定量基准来评估TID对当前镜像性能的影响.
- 结果强调在设计辐射硬化n-MOSFET电流反光镜时需要考虑TID效应.
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