您也可能阅读
通过共同作者、期刊和引用图与本文相关的文章。
Updated: Jan 16, 2026
Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
Published on: February 12, 2017
Jingwen Li1, Xinghui Li1
1Shenzhen International Graduate School, Tsinghua University, Shenzhen 518071, China.
干扰光刻法 (IL) 为先进的传感器制造纳米级图案. 本综述详细介绍了光学控制方法,以提高传感器的灵敏度,分辨率和可靠性.
科学领域:
背景情况:
研究的目的:
主要方法:
主要成果:
结论:
Microfluidic Buffer Exchange for Interference-free Micro/Nanoparticle Cell Engineering
Published on: July 10, 2016
Control of Cell Geometry through Infrared Laser Assisted Micropatterning
Published on: July 10, 2021