测量距离对线性泰勒图案的影响,其中减少了内侧叶片
Aldara Seoane-Campos1, María Elena López-Martín2, Juan Antonio Rodriguez-Gonzalez1
1Radiating Systems Group, Department of Applied Physics, University of Santiago de Compostela, 15782 Santiago de Compostela, Spain.
Sensors (Basel, Switzerland)
|September 27, 2025
概括
这项研究分析了天线模式,重点关注压抑的内叶如何影响性能. 降低内叶水平可以最大限度地减少干扰,优化线性分布的天线效率.
科学领域:
- 电磁学和天线理论
- 信号处理和天线设计.
背景情况:
- 天线图案经常显示高侧叶,这可能导致干扰.
- 压抑的内叶对于最小化干扰和提高天线设计效率至关重要.
- 泰勒分布为分析天线侧叶水平提供了一个框架.
研究的目的:
- 调查距离对泰勒图的影响,其中有不同数量的压抑的内叶.
- 在线性分布中分析侧叶水平和天线性能之间的权衡.
- 通过战略定位内部叶片来优化天线效率.
主要方法:
- 利用艾略特的古典方法计算泰勒分布中的根.
- 分析了线性分布,其中一个,两个和三个内叶被压缩.
- 设置侧叶水平 (SLL) 对外叶为-20 dB,对第一个内叶为-40 dB,n ̄=6.
主要成果:
- 证明了距离对泰勒图的特征的影响.
- 量化了压抑的内叶对干扰水平的影响.
- 证实了降低内叶水平以提高天线效率的有效性.
结论:
- 压缩的内叶的战略定位对于有效的天线操作至关重要.
- 泰勒图为可视化和分析天线模式特征提供了宝贵的工具.
- 该方法为设计具有减少干扰和优化性能的天线提供了基础.
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