在β-Ga2O3中打破p型兴奋剂屏障:一种基于GaN的异质连接双极晶体管,具有高增益,高破坏性和射频能力
Phuc Hong Than1, Tho Quang Than2, Yasushi Takaki3
1Duy Tan University (DTU) 3 Quang Trung, Hai Chau Danang 550000 Vietnam thanhongphuc@duytan.edu.vn.
RSC advances
|October 10, 2025
概括
这项研究引入了一种新的氧化/化异界双极晶体管 (HBT),克服了氧化中的p型兴奋剂挑战. 模拟设备表现出卓越的功率电子性能,包括高断电压和频率响应.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
- 设备工程 设备工程
背景情况:
- 单极β-氧化物 (β-Ga2O3) 装置得到了充分的研究.
- 双极器件的进步,特别是异极连接双极晶体管 (HBT),由于缺乏可靠的p型兴奋剂在β-Ga2O3.3,因此受到限制.
研究的目的:
- 介绍功能性HBT的第一个全面模拟,以解决β-Ga2O3.3.中的p型兴奋剂挑战.
- 提出一种β-Ga2O3/GaN HBT结构,使用n型β-Ga2O3发射器,p型GaN基和n型GaN采集器.
主要方法:
- 考虑陷的全面设备模拟.
- 对300K至460K的温度依赖电流-电压 (I-V) 特性进行分析.
- 通过工程基础和集体厚度来优化设备性能.
- 高频模拟以确定截止频率 (fT).
主要成果:
- 模拟的Ga2O3/GaN HBT实现了18.3的最大直流增益 (βDC) 和14.3 kA cm-2.2的高集电器电流密度 (JC).
- 演示了120V的集电基断裂电压 (BVCBO) 和41.3MWcm-2.2的功率功率 (PFOM).
- 观察到高达460K的稳定运行,在300K时的切断频率 (fT) 为30GHz.
- 优化设备性能显示,PFOM提升到138MW cm−2的厚度收集器 (2.0μm) 和薄底 (0.05μm).
结论:
- Ga2O3/GaN HBT是下一代动力电子产品的一个有希望的候选者.
- 该设备表现出高分断电压和优异的频率性能的独特组合.
- 模拟证实适用于射频和功率切换应用的适用性.
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