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远紫外线 (222纳米) 增强了Per-和多基基物质 (PFAS) 破坏的先进减少过程

Xiaoyue Xin1, Jiaqi Li1, Ching-Hua Huang1

  • 1School of Civil and Environmental Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States.

ACS ES&T water
|October 16, 2025
PubMed
概括

远紫外线 (222纳米) 光与硫酸盐高级还原工艺 (ARP) 结合,显著增强了水中的和多基物质 (PFAS) 降解. 这种UV222/硫酸盐方法比传统的UV254/硫酸盐系统更节能和有效.

关键词:
遥远的紫外线 (UVC)KrCl* 排泄剂灯的使用情况在PFAS中,有很多方法.这就是为什么PFOS是PFOS.通过先进的减少工艺.脱化除的方法含水电子的化电子处理水处理水的方法

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