pH

Utsab Banerjee1, Sayan Ganguly2, Xiaowu Shirley Tang2

  • 1Department of Mechanical & Mechatronics Engineering, Waterloo Institute for Nanotechnology, University of Waterloo, Waterloo, Ontario N2L 3G1, Canada.

概括

这项研究引入了一种双响应的水凝平台,可以通过pH和磁性刺激来控制染料释放. 磁性激活显著提高释放率与pH仅控制相比,使先进的治疗交付.