概括
一种新的基于连贯长度的光学近距离校正 (OPC) 方法通过限制边缘细分来简化面具制造. 这种方法可以降低高级光刻的面具复杂性和计算成本,而不会影响图像质量或性能.
科学领域:
- 光学光刻法光学光刻法.
- 纳米制造的纳米制造
- 图像处理 图像处理
背景情况:
- 一致长度定义了光学相关性范围,对于成像系统至关重要.
- 目前的光学近距离校正 (OPC) 方法增加了面具的复杂性和成本.
- 现有的OPC超细分边缘,没有提高图像质量.
研究的目的:
- 提出一种基于连贯度长度的新型OPC方法.
- 为了减少面具复杂性和计算成本在先进的石版画.
- 为了保持或改善成像性能和曝光度.
主要方法:
- 模拟分析面具变化对空中图像和关键维度 (CD) 的影响.
- 开发基于连贯度的OPC方法.
- 将多边形边缘分割限制在连贯度长度 (最大3段) 之内.
主要成果:
- 面具的变化显著影响空中图像轮和CD在连贯长度内.
- 拟议的方法有效地减轻复杂的2D图案的图像波纹.
- 实现了可比的临界维度 (CD) 和暴露度 (EL) 性能.
结论:
- 一致长度为有效的OPC提供了物理边界.
- 拟议的方法提高了面具校正效率,并简化了制造.
- 这种方法为高级光刻面具优化提供了实际指导.
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