概括
一个新的超薄的制热保护窗口有效地保护光学元件免受极端紫外线的影响,通过减少80%的热透镜,提高了光刻系统的稳定性和测量精度.
科学领域:
- 材料科学 材料科学 材料科学
- 光学工程是指光学工程.
- 等离子体物理学的物理学
背景情况:
- 极端紫外线 (EUV) 光源对于先进的光刻技术至关重要.
- 激光制造的等离子源需要实时监控,以确保稳定的EUV输出.
- 来自这些来源的宽带辐射会导致光学窗户中的热透镜,降低性能.
研究的目的:
- 为EUV光刻系统开发一种新的热保护窗口 (TPO窗口).
- 克服现有的TPO窗户的局限性,例如深紫外线 (DUV) 吸收和制造复杂性.
- 提高EUV系统的稳定性和测量精度.
主要方法:
- 使用超薄 (Al) 层制造热保护窗口.
- 描述窗户在紫外线,可见光,近红外和中远红外光谱中的透射率和反射率.
- 评估窗户的环境稳定性和热透镜减少能力.
主要成果:
- 超薄的Al TPO窗口在266nm时表现出67.7%的透射率.
- 实现了64% (200-2500nm) 的平均反射率和>96%的反射率 (2.5-11μm).
- 与裸体基板相比,证明了卓越的环境稳定性和减少了约80%的热透镜.
结论:
- 超薄的基于Al的TPO窗户为EUV光刻提供了实用和有效的解决方案.
- 这项技术提高了EUV光源的稳定性和测量精度.
- 开发的TPO窗口解决了当前EUV光刻光学系统中的关键挑战.
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