Bi2O2以Se为基础的单立体浮动门非挥发性存储器,具有增强的电荷保留和切换性能
Chi-Chun Cheng1, Hsing-Chien Chien2, Tai-Ting Lee3,4
1Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan.
ACS nano
|November 17, 2025
概括
研究人员使用Bi2O2Se.Se开发了一种新的单材料非挥发性存储器 (NVM). 这一突破整合了所有内存功能,克服了传统内存缩放和制造方面的挑战.
科学领域:
- 材料科学 材料科学 材料科学
- 固态电子 固态电子
- 纳米技术 纳米技术
背景情况:
- 传统的浮式门内存由于电荷泄漏和复杂结构而面临扩展限制.
- 现有的二维非挥发性存储器 (NVM) 设备通常需要多个材料层来实现不同的功能.
研究的目的:
- 使用单一的2D材料开发一个单一的NVM设备.
- 在一个材料系统中集成通道,电荷存储和道功能.
- 为了克服当前二维NVM的制造复杂性和可扩展性问题.
主要方法:
- 使用单一的2D材料Bi2O2Se,用于设备构造.
- 使用紫外线臭氧处理形成晶体氧化物外 (β-Bi2SeO5).
- 通过热化引入空缺,以创建用于存储电荷的金属核心 (m-BOS).
主要成果:
- 实现了一个单体NVM设备集成通道 (s-BOS),存储 (m-BOS) 和道 (BOS氧化物) 功能.
- 证明了大内存窗口,高存储密度 (~5 × 10^13 cm^-2),以及开/关比> 10^8.8.
- 呈现出快速编程/删除 (±12V,100毫秒),耐力 (>2000周期) 和保留 (>10^4秒) 的情况.
结论:
- 单一材料Bi2O2Se平台简化了制造,并提高了2DNVM设备的可扩展性.
- 这种方法为多层内存架构提供了一个有希望的替代方案.
- 设备性能指标符合高级内存应用程序的要求.
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