在GaN HEMT上单立体集成的3D TFTs的演示,使用高断裂电压 (> 1900 V) 的cascode配置
Tian-Li Wu1,2, Hsin-Jou Ho3, Chia-Wei Liu3
1Institue of Electronics and Department Electronics and Electrical Engineering, National Yang Ming Chiao Tung University, Hsinchu, Taiwan. tlwu@nycu.edu.tw.
Scientific reports
|November 17, 2025
概括
研究人员在高电子流动性化 (GaN) 晶体管上实现了无形--氧化物 (a-IGZO) 薄膜晶体管的3D单体集成,达到超过1900V的断裂电压.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 半导体设备物理 半导体设备物理
背景情况:
- 化 (GaN) 高电子流动性晶体管 (HEMT) 提供高功率性能.
- 无形--氧化物 (a-IGZO) 薄膜晶体管 (TFT) 适合集成,因为它们的加工温度低.
- 案号配置对于高压电源设备的运行至关重要.
研究的目的:
- 在GaN HEMTs上直接演示a-IGZO TFTs的第一个三维单体集成.
- 为了评估a-IGZO通道厚度对cascode配置中的设备性能的影响.
- 在集成设备中实现超高的断裂电压.
主要方法:
- 制造两种设备变体,a-IGZO通道厚度为30nm和10nm.
- 电气性能的表征,包括值电压,开/关电流比率,下值波动和故障电压.
- 分析道厚度对设备性能和故障特征的影响.
主要成果:
- 成功地将a-IGZO TFTs的三维单体集成到GaN HEMT上,在一个cascode配置中.
- 达到超过1900V的故障电压,相当于独立的GaN HEMT.
- 10纳米的a-IGZO通道装置显示了正值值电压 (+0.53V),ON/OFF比率为10^7,以及低次值摆动 (90 mV/dec).
结论:
- 在高压cascode应用中,a-IGZO TFTs在GaN HEMT上的3D单体集成是可行的.
- 降低a-IGZO通道厚度可以增强静电控制并抑制泄漏,从而导致高断电压.
- 这种整合为开发紧,高压氧化物和基电源设备提供了有前途的途径.
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