Si3N4

Tanuj Kumar1, Demeng Feng1, Shenwei Yin1

  • 1Department of Electrical and Computer Engineering, University of WisconsinMadison, Madison, Wisconsin 53706, United States.

ACS photonics
|November 24, 2025
PubMed
概括

立体测量化 (Si3N4) 膜具有较低的光学损失,使其适用于激光光帆. 一种新的自参照光热通路干扰测量 (PCI) 技术验证了它们在高强度激光推进中的性能.

相关概念视频