白光色度干涉测量用于测量半导体结构上的厚度和地形
Jaeseung Im1, Heewoo Lee1, Kyeongjun Jang1
1Department of Physics, Incheon National University, Academi-ro 119, Incheon, 22012, Republic of Korea.
Scientific reports
|November 25, 2025
概括
这项研究引入了色度白光干扰计 (WLI) 用于精确的薄膜测量. 该方法准确地确定了地形和100nm以下薄膜的厚度,经过TEM和AFM的验证.
科学领域:
- 计量学 计量学 计量学
- 光学测量 测量 光学测量
- 薄膜分析 薄膜分析
背景情况:
- 反射计和白光干扰计 (WLI) 是用于厚度和地形测量的高分辨率技术.
- 精确地描述薄膜,特别是100nm以下的薄膜,仍然是计量学的挑战.
研究的目的:
- 展示一种色度测量WLI方法与反射计相结合,用于同时测量薄膜的地形和厚度.
- 为了实现光学显微镜侧面分辨率低于1μm的薄膜结构的计量成像.
主要方法:
- 使用彩色摄像头和多带宽波器进行色度WLI和反射计.
- 采用色度反射计来确定薄膜厚度,并在WLI装配过程中固定它以提取表面地形.
- 测量了二氧化 (SiO2) / (Si) 表面结构的3D计量图像.
主要成果:
- 在Si mesa结构上成功测量了SiO2薄膜厚度从20nm到150nm.
- 实现了对基板的测量,测量了几纳米级的深度.
- 从传输电子显微镜 (TEM) 和原子力显微镜 (AFM) 的光学3D图像和测量结果之间证明了一致性.
结论:
- 拟议的色度WLI方法可以同时测量20nm薄膜的地形和厚度.
- 该技术为微电子结构和薄膜表征提供了高分辨率计量技术.
- 结果验证了色度计方法在先进光学计量学中的有效性.
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