一个分裂门双通道不对称的SiC沟MOSFET,可提高门氧化物可靠性和动态特性
Feng Xu1, Yonghao Dong2, Fa Li2
1College of Physical Science and Technology, Yangzhou University, Yangzhou, 225009, China. fengxu@yzu.edu.cn.
Scientific reports
|November 26, 2025
概括
一种新型的分裂门双通道不对称的碳化沟MOSFET (SGDC-ATMOS) 提高了设备的可靠性和性能. 这种设计显著降低了高效功率电力电子产品的电场应力和门排水电容.
科学领域:
- 半导体设备物理学 半导体设备物理
- 动力电子产品的动力电子.
- 材料科学是一种材料科学.
背景情况:
- 传统的不对称沟MOSFET面临着门氧化物可靠性和寄生能力方面的挑战.
- 沟结构中的高电场可以降低设备的性能和寿命.
- 优化电容和电流传导对于先进的电源应用至关重要.
研究的目的:
- 提出和分析一种新的分裂门双通道不对称的SiC沟MOSFET (SGDC-ATMOS).
- 通过降低最大电场 (Emox) 来提高门氧化物可靠性.
- 为了增强动态特性和电流传导能力.
主要方法:
- 拟议的SGDC-ATMOS结构的设备模拟和分析.
- 与传统的不对称沟MOSFET (C-ATMOS) 设计进行比较.
- 研究电荷平衡效应和结构变化 (分门,P+屏蔽区域,电流扩散层).
主要成果:
- 实现了最大门氧化物电场 (Emox) 的 31.5% 的降低.
- 证明了门排水容量减少了98.4%.
- 观察到特定电阻减少了5%.
- 改善了电流传导,并减轻了JFET效应.
结论:
- SGDC-ATMOS结构提供了卓越的氧化物可靠性和动态特性.
- 该设计非常适合用于高性能,低功耗的应用.
- 优化的P+屏蔽区域长度进一步增强了电容特性.
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