使用W1-xCrxSe2 p型WSe2 FETs的合金接口进行孔径电流增强
Young-Jun Sim1, Junil Kim1, Jieun Lee1
1Department of Electrical Engineering and Computer Science, DGIST, Daegu 42988, Republic of Korea.
ACS applied materials & interfaces
|November 27, 2025
概括
我们开发了一种新的W$_{1-x}$Cr$_{x}$Se$_{2}$合金接口,用于化 (WSe$_{2}$) 场效应晶体管 (FET). 这种方法克服了费米级别的固定,大大降低了高性能p型设备的接触电阻.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 半导体设备物理 半导体设备物理
背景情况:
- 二维 (2D) 过渡金属二甲基化物 (TMD),如化 (WSe$_{2}$),对下一代半导体设备具有前景.
- 使用WSe$_{2}$的高性能p型场效应晶体管 (FET) 受到费米水平固定 (FLP) 的阻碍,导致两极行为和高接触电阻.
- 像范德瓦尔斯 (vdW) 接触器这样的当前解决方案面临着污染和CMOS过程兼容性的挑战.
研究的目的:
- 在WSe$_{2}$ FET中展示一种可扩展的方法,用于在WSe$_{2}$ FET中创建低电阻p型接触.
- 克服FLP并通过设计一种新的W$_{1-x}$Cr$_{x}$Se$_{2}$合金接口来提高设备性能.
- 为了使WSe$_{2}$能够集成到先进的CMOS技术中.
主要方法:
- 制造WSe$_{2}$ FET使用Cr$_{x}$Se$_{2}$合金接口的WSe$_{1}$合金接口,由Cr接触的热制成.
- WSe$_{2}$/W$_{1-x}$Cr$_{x}$Se$_{2}$/Cr接口层的表征. 这是一个很好的方法.
- 电气测量以评估设备性能,包括接触电阻和开/关电流比.
主要成果:
- W$_{1-x}$Cr$_{x}$Se$_{2}$合金接口有效地抑制了FLP和不必要的双极行为.
- 实现了显著降低的舒特基屏障高度 (低至61.1 meV),接触电阻降低了大约3个数量级.
- 合金接口的FET表现出强大的p型性能,在20个设备中平均开/关电流比为2.19 × 10^8$.
结论:
- 合金接口W$_{1-x}$Cr$_{x}$Se$_{2}$提供了一个实用且可扩展的策略,用于在WSe$_{2}$中设计低阻力p型接触.
- 这一进步对于实现高性能WSe$_{2}$ FETs至关重要,并促进了基于TMD的互补逻辑电路的开发.
- 这些发现代表了将二维材料集成到未来规模化的CMOS技术中的重要一步.
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