3nm以下FinFET的接触工程中的突破:克服角瓶
Yoonwoo Choi1, Bogyeong Kim1, Geonu An1
1School of Electrical and Electronics Engineering, Pusan National University, Busan, Republic of Korea.
Nanotechnology
|November 27, 2025
概括
一个新的I形源/排水架构使FinFET能够通过克服角限制,扩展到3nm以下的节点. 这一突破保持了电性能,同时为先进的半导体制造铺平了道路.
科学领域:
- 半导体设备物理 半导体设备物理
- 先进的材料科学科学 材料科学
- 纳米技术纳米技术
背景情况:
- 芬菲特 (Fin Field-Effect Transistor) 设备的缩放受到角 (FP) 瓶的阻碍.
- 传统的钻石形源/排水 (S/D) 架构限制了进一步的小型化.
研究的目的:
- 为FinFETs引入一个新的I形S/D架构.
- 为了使FinFET能够超越当前的局限性扩展,目标是3nm以下的节点.
- 在缩放过程中保持或改善电性能.
主要方法:
- 提出了一个I形S/D架构来取代传统的钻石形S/D.
- 使用校准的3D技术计算机辅助设计 (TCAD) 模拟.
- 根据固定的细胞面积目标,对接触的聚粉 (CPP) 和FP进行了协调共优化.
主要成果:
- I型的S/D设计最大限度地减少了横向突出,同时维持或改善了ON状态电流和下值摆动.
- 协同优化允许延长门长度和增强静电控制,抑制短通道效应.
- 灵敏度分析证实了在现实的特定接触电阻值中过程窗口的稳定性.
结论:
- 从源/排水几何学进行脱的FinFET角缩放.
- 建立了一条有利于制造业的途径,实现3nm以下的FinFET.
- 避免了批发架构变化的需要,例如过渡到通道全方位 (GAA) 架构.
相关概念视频
Biasing of FET
657
Biasing a Junction Field Effect Transistor (JFET) is crucial for setting operational parameters and ensuring efficient functioning in electronic circuits. JFETs are characterized by using a single carrier type in N-channel or P-channel configurations, where the channel is surrounded by PN junctions. These junctions are central to the device's ability to control current flow.
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
657
MOSFET: Enhancement Mode
750
Enhancement-mode MOSFETs are pivotal components in electronics, distinguished by their capacity to act as highly efficient switches. They are part of the larger family of metal-oxide Semiconductor Field-Effect Transistors (MOSFETs). They are available in two types: p-channel and n-channel, each tailored to specific polarity operations.
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
750
Metal-Semiconductor Junctions
874
The contact of metal and semiconductor can lead to the formation of a junction with either Schottky or Ohmic behavior.
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
874


