:SiC

Aaditya Bhat1, Colin Gilgenbach1, Junghwa Kim1

  • 1Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, United States.

Ultramicroscopy
|November 27, 2025
PubMed
概括

多切片电子图解可以以原子分辨率描述点缺陷,将它们定位在单元细胞深度内. 这种技术对于分析碳化等材料的缺陷非常有价值.