Ga2O3SiC

Yi Shen1,2,3,4, Xin Qi1,2, Yuan Li5

  • 1Institute of Wide Bandgap Semiconductors and Future Lighting, College of Intelligent Robotics and Advanced Manufacturing, Fudan University, Shanghai, China.

Nature communications
|November 28, 2025
PubMed
概括

研究人员开发了一种新的中间层,用于在氧化 (Ga2O3) 和碳化 (SiC) 之间产生强大的共价键. 这显著提高了导热率,并减少了Ga2O3电子产品的自热.