强大的多层存储特性Al2O3/HfO2/Al2O3三层结构的memristor通过原子层沉积制造用于神经形态计算的原子层沉积

Jian Liu1,2, Xiaolong Zhou1, Junjun Ouyang1

  • 1School of Electronic and Electrical Engineering, East China University of Technology, Nanchang 330013, People's Republic of China.

Nanotechnology
|December 1, 2025
PubMed
概括

这项研究介绍了一种新的三层记忆器,用于高密度记忆和神经形态计算. 调整RESET停止电压提供了比合规电流调整更稳定的多层存储,在数字识别中达到91.6%的准确性.

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