高性能多重倒置层选择性埋藏的三门垂直沟功率MOSFET
M Ejaz Aslam Lodhi1, Sajad A Loan2, Abdul Quaiyum Ansari1
1Department of Electrical Engineering, Jamia Millia Islamia, New Delhi, India.
Scientific reports
|December 9, 2025
概括
这项研究引入了一种新型的垂直三门功率MOSFET (TGSBTPMOS),显著改善了状态电流和降低了电阻. 先进的设计增强了动力电子应用的静态和切换性能.
科学领域:
- 半导体设备物理 半导体设备物理
- 电力电子 电力电子 电力电子
背景情况:
- 传统的电源 MOSFET 面临着当前状态和电阻的限制.
- 优化设备架构对于增强电源处理能力至关重要.
研究的目的:
- 分析了一种新的垂直三门选择性埋下沟功率MOSFET (TGSBTPMOS) 的特性.
- 与传统设计相比,评估TGSBTPMOS提供的性能改进.
主要方法:
- 一种新的垂直三门选择性埋下沟功率MOSFET的设备制造和特征.
- 使用 2-D Silvaco ATLAS 模拟来分析设备性能指标.
主要成果:
- 该TGSBTPMOS表现出超低的启动电阻 (0.38 mΩ.cm2) 和高的启动电流.
- 在门到排水负荷 (Qgd),阻力 (Ron.sp) 和Balliga的优点数据 (FOM1,FOM2) 中观察到显著的改善.
- 在FOM1中实现了4.86个数量级的改进,在Ron.sp中达到68.85%,在Qgd中达到94.54%,在FOM2.中达到98.34%.
结论:
- 拟议的TGSBTPMOS显示出优越的静态和切换性能.
- 这种新的设备架构代表了功率MOSFET技术的重大进步.
相关概念视频
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