不同纳米级通道长度在低温生长的侧面MoS记忆器中的影响2
Danyun Wang1, Daquan Yu1, Hongyu Chen2
1School of Electronic Science and Engineering, Xiamen University, Xiamen 361005, P. R. China.
ACS applied materials & interfaces
|December 10, 2025
概括
二硫化物 (MoS2) 记忆器显示出对人工智能硬件有前景的扩展潜力. 它们的性能指标,包括SET电压和脉冲要求,随着更小的通道长度而下降,与晶体管缩放趋势保持一致.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 人工智能 硬件 硬件
背景情况:
- 基于二硫化 (MoS2) 的记忆器是类似大脑的人工智能硬件的关键.
- 了解尺寸缩放效应对于高密度神经网络至关重要.
研究的目的:
- 研究道长度对横向MoS2记忆器性能的影响.
- 确定MoS2记忆器是否可以匹配晶体管尺寸缩放.
主要方法:
- 使用低温MOCVD制造的侧面MoS2记忆器.
- 不同的通道长度从大约14到52纳米.
- 测量了电阻切换行为和脉冲响应.
主要成果:
- 设置电压下降的比例与通道长^1.69.
- HRS转换为LRS的值脉冲与通道长度^2.87.7.2进行缩放.
- LIF神经元峰值的值脉冲大小与通道长度^1.01.1进行缩放.
结论:
- 随着通道长度的下降,MoS2记忆器的性能会变得更好.
- 电压,脉冲数和振幅要求比线性下降更快地下降.
- 结果支持MoS2记忆元与AI应用中的晶体管缩放的兼容性.
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