高K间隔器诱导压力Si/SiGe通道基门全周FET的开发和性能分析用于热效应
Potaraju Yugender1,2, Sneha Singh1, Kuleen Kumar3
1Department of Electronics and Communication Engineering, National Institute of Technology Mizoram, Chaltlang, Aizawl 796012, Mizoram, India.
研究人员开发了一种使用 - (SiGe) 的新型门全方位场效应晶体管 (GAA FET),其门底层为2纳米. 这项创新显著提高了无线电频率性能,并降低了先进电子产品的功耗.
科学领域:
- 半导体设备物理学 半导体设备物理
- 材料科学用于电子产品.
背景情况:
- 无线电频率 (RF) 应用需要高性能晶体管.
- 现有的场效应晶体管 (FET) 在速度,功率效率和寄生效应方面面临限制.
研究的目的:
- 为了研究一个结合- (SiGe) 和一个特定的门底层的门堆门全方位 (GAA) FET的性能提升.
- 为了评估2纳米门底层和高k间隔器对电气和射频模拟特征的影响.
主要方法:
- 一个门堆GAA FET与SiGe和2nm门底层的制造.
- 在门堆结构中封装一个高k间隔器.
- 制造设备的电气和无线电频率性能特征.
主要成果:
- 在排水电流中增加了192.52%和减少了98%的非状态电流 (IOFF).
- 显示了11.24%的下值波动减少,改善了离子/离子比率并控制了短通道效应 (SCE).
- 展示了改进的线性参数 (VIP2,VIP3,IIP3) 和减少的波扭曲 (IMD3,THD).
结论:
- 基于SiGe的Gate Stack GAA FET具有2nm门底层和高k间隔器,提供卓越的电气和射频性能.
- 该设备非常适合用于高性能,低功耗的CMOS电路,物联网和5G/6G应用.
- 该设计通过提高效率为可持续的电子解决方案做出了贡献.
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