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宽带EMI屏蔽性能在光学透明的灵活的薄膜结构中

Anton S Voronin1,2,3, Sergey V Nedelin4,5, Nikita A Zolotovsky4,5

  • 1Regional Educational and Scientific Center "Security", Bauman Moscow State Technical University, 105005 Moscow, Russia.

Materials (Basel, Switzerland)
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PubMed
概括

灵活的In2O3/Ag/In2O3薄膜提供透明的电磁干扰 (EMI) 屏蔽. 这些薄膜为先进的电子和电信提供高光学透明度和导电性.

关键词:
在EMI屏蔽中使用EMI屏蔽.在2O3中.这就是THz-TDSDS.氧化物/金属/氧化物结构薄膜是一种薄膜.

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科学领域:

  • 材料科学 材料科学 材料科学
  • 凝聚物质物理学 凝聚物质物理学
  • 电气工程 电气工程

背景情况:

  • 灵活的电子设备和5G/6G设备需要具有透明度,导电性和电磁干扰 (EMI) 屏蔽的材料.
  • 同时实现高光学透明度,低板电阻和有效的宽带屏蔽是具有挑战性的.

研究的目的:

  • 为了合成和表征灵活的氧化物/银/氧化物 (IAI) 结构,用于透明的EMI屏蔽应用.
  • 优化IAI结构,以提高光学,电气和屏蔽性能.

主要方法:

  • 在聚乙烯二甲基板上合成柔性IAI薄膜.
  • 对光传输率,板电阻,光雾和宽带EMI屏蔽 (10MHz至1THz) 的全面描述.
  • 在重复曲下对机械弹性进行评估.

主要成果:

  • 优化的IAI结构 (13.2 ± 1.1 nm Ag中间层) 在500 nm实现了82.59%的光传输率和6.4 ± 0.8 Ω/sq的低板电阻.
  • 微不足道的光学雾 (1.04%) 和统一的宽带EMI屏蔽25-30dB从无线电波到特拉赫兹频率.
  • 证明了出色的机械弹性,在重复曲后保持性能.

结论:

  • 灵活的IAI薄膜为透明的EMI屏蔽提供了一个有希望的解决方案.
  • 光学,电气,机械和屏蔽性能的独特组合使IAI适用于先进的电信和灵活的光电子.