在β-Ga2O3Schottky屏障二极管中直接探测陷动力学,使用单电压脉冲表征
Thanh Huong Vo1,2, Sunjae Kim1,3, Ji-Hyeon Park3
1Department of Materials Science and Engineering, Korea Aerospace University, Goyang, 10540, Republic of Korea.
Advanced science (Weinheim, Baden-Wurttemberg, Germany)
|December 14, 2025
概括
一种新的单脉冲方法有效地探测了氧化 (β-Ga2O3) 功率电子中的陷动态. 该技术量化了陷密度和捕获时间,这对于通过了解载体限制来提高设备性能至关重要.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
- 电气工程 电气工程
背景情况:
- 氧化 (β-Ga2O3) 是高级功率电子产品的关键超宽带间半导体.
- β-Ga2O3设备的性能限制主要是由捕获电荷载体的陷状态引起的.
研究的目的:
- 引入和验证单脉冲表征方法,用于直接分析β-Ga2O3Schottky屏障二极管 (SBD) 中的陷动态.
- 在现实的操作条件下量化陷密度,载体捕获时间和激活能量.
主要方法:
- 在不同脉冲参数 (宽度,升降时间,振幅) 和温度下,系统地研究β-Ga2O3 SBD中的短暂电流响应.
- 在恒压阶段分析电流衰变,以确定陷参与.
- 指数式适配和取决于温度的测量以提取时间常数和激活能量.
主要成果:
- 确定中性区域的陷逐渐捕获电子,导致电流衰变.
- 由于陷反应延迟,观察到瞬态的不对称性.
- 在Schottky十字路口附近,总陷密度约为5×1014cm-2.
- 确定了2V前向偏差的~30μs的载体捕获时间常数和~0.16 eV的陷激活能量.
结论:
- 单脉冲方法提供了一种直接和有效的手段来评估β-Ga2O3设备中的陷状态.
- 了解陷动态对于减轻氧化物动力电子产品的性能退化至关重要.
- 描述的陷参数为优化β-Ga2O3设备设计和可靠性提供了宝贵的见解.
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