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Shicui Xing1, Dong Wang2, Zhipeng Fan1

  • 1National Engineering Research Center for Colloidal Materials, School of Chemistry and Chemical Engineering, Shandong University, Jinan, Shandong, 250100, P. R. China.

概括

研究人员开发了先进的氧化光电阻,使用混合联体战略进行高分辨率纳米光刻. 这项创新显著改善了下一代光刻应用的特征尺寸和线宽粗度.

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