相关实验视频
Updated: Jan 8, 2026

10:17
20 mJ, 1 ps Yb:YAG Thin-disk Regenerative Amplifier
Published on: July 12, 2017
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基于深紫外线的高能,强电场的朱尔级放大器,配有分布式面冷却芯片
Optics letters
|December 15, 2025
概括
使用分布式面冷却 (DFC) 技术开发了一种新的高能深紫外线 (DUV) 激光系统. 该系统在室温下实现朱尔级脉冲能量,适用于脉冲激光沉积等应用.
科学领域:
- 激光物理 激光物理
- 材料科学 材料科学 材料科学
背景情况:
- 高能脉冲激光器对于先进的材料加工至关重要.
- 现有系统经常面临热管理挑战,限制性能.
研究的目的:
- 开发一种高能,强场深紫外 (DUV) 脉冲系统.
- 利用分布式面冷却 (DFC) 技术来改善热管理.
主要方法:
- 使用了一种二极管的固态激光.
- 采用了基于DFC芯片的亚纳秒,焦尔级放大器,使用Nd:YAG和蓝宝石.
- 在20 Hz的重复率下运行,可以灵活调节脉冲能量和重复率.
主要成果:
- 在266 nm时达到235 mJ的脉冲能量.
- 证明了 480 ps 的亚纳秒脉冲宽度.
- 达到0.49GW的峰值功率,相当于排挤激光器.
结论:
- DFC芯片技术可以在室温下以最小的热效应实现朱尔级脉冲能量.
- 开发的DUV激光系统适用于脉冲激光沉积应用.
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