概括
使用深紫外线 (DUV) 干扰测量对化 (CaF2) 窗户的光学测试显示了显著的指数均性改进. 这种先进的方法对于高分辨率光刻光学至关重要.
科学领域:
- 光学和材料科学 材料科学
- 半导体制造技术技术 半导体制造
背景情况:
- 对于半导体光刻中的高分辨率光学系统的严格要求需要精确的偏差控制.
- 使用可见光源的传统Fizeau干扰度在紫外线 (UV) 波长区域评估光学材料时面临限制,原因是分散效应.
研究的目的:
- 为了评估Czochralski种植的单晶CaF2光学窗口的指数均性.
- 开发和应用深紫外线 (DUV) 干涉测量方法用于光学材料的表征.
主要方法:
- 在家制造的DUV Fizeau干扰仪的开发和自我校准,用于波长测量.
- 实施次孔径接干扰计,以评估全孔径指数分布.
- 使用商用可见波长Fizeau干扰仪进行比较分析.
主要成果:
- 在DUV波长区域进行了对单晶CaF2光学窗口的干扰度测量.
- 通过DUV Fizeau干扰仪,可以准确评估目标波长区域的指数均性.
- 使用DUV干涉测量测量的不均性被发现是可见波长干涉测量测量的近一半.
结论:
- DUV干涉度是评估光学材料的指数均性的优质方法,用于UV光刻.
- 开发的DUV Fizeau干扰仪和拼接技术提供了对CaF2光学窗户的准确描述.
- 精确的材料表征对于在下一代光刻工具中推进无偏差光学至关重要.
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