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Updated: Jan 8, 2026

Fabrication of Spatially Confined Complex Oxides

Fabrication of Spatially Confined Complex Oxides

Published on: July 1, 2013

使用 (EtCp) Ir (CHD) 和大气 O2 / N2 等离子体的空间原子层沉积

Mike L van de Poll¹, Jie Shen², Paul Poodt^1,3

¹Department of Applied Physics and Science Education, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands.

The journal of physical chemistry. C, Nanomaterials and interfaces

|December 18, 2025

概括

空间原子层沉积 (SALD) 能够为绿色生产提供高效,超薄的氧化 (IrO2) 薄膜. 这种方法尽量减少了在质子交换膜 (PEM) 电解器中昂贵的的使用.

科学领域:

材料科学材料科学材料科学
电化学电化学电化学
化学工程是化学工程的重要组成部分.

背景情况:

高容量,负担得起的电催化剂对于通过质子交换膜 (PEM) 水电解来生产绿色至关重要.
氧化 (IrO2) 是一种在酸性介质中高度活跃和稳定的氧化演化反应 (OER) 催化剂,但其高成本和稀缺性需要减少使用.
空间原子层沉积 (SALD) 为沉积超薄催化膜提供了精确的控制,一致性和高吞吐量.

研究的目的:

开发和描述超薄氧化 (IrOx) 薄膜的空间原子层沉积 (SALD) 过程.
为了研究沉积温度,等离子体暴露和沉积后回火对薄膜特性的影响.
评估SALD沉积的IrOx对于质子交换膜 (PEM) 电解剂应用的适用性.

主要方法:

在使用 (EtCp) -Ir-(CHD) 前体和在不同温度 (80-150°C) 的大气O2/N2等离子体时开发了一种SALD工艺.
研究了生长动力学,杂质水平,薄膜结晶性和金属集群形成.
评估了高面积比结构上的膜合规性,并确定了氧基重组的概率.

主要成果:

实现了和生长,每周期的生长率为0.66 Å,温度为150°C.
随着温度升高至150°C,杂质含量显著降低;金属Ir集群在~150-180°C以上形成.
证明了PEM细胞中多孔运输层的足够一致性,并确定氧基重组概率为~10−3.3.

结论:

开发的SALD工艺使得高质量的超薄IrOx薄膜的生产成为可能,这些薄膜具有受控的性能.
优化的沉积条件和沉积后化 (PDA) 产生适合OER催化的石化晶体IrO2.
萨尔德是一种有前途的高吞吐量技术,可最大限度地降低成本高效的PEM电解器中的负载.

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