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Updated: Jun 9, 2026

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在基于束干扰的光刻系统中测量晶圆对齐度

Lijun Zhou, Xiangzhao Wang, Zhongliang Li

|December 19, 2025

概括

这项研究引入了一种新的束干涉测量方法,用于半导体制造中的高精度晶圆对齐. 这种技术实现了极好的线性和可重复性,为石版系统提供了一个有前途的替代方案.

科学领域:

光学和光子学在光学和光子学.
半导体制造技术技术半导体制造
计量学计量学计量学

背景情况:

覆盖精度对于集成电路制造至关重要.
高性能晶圆对齐对于实现覆盖精度至关重要.
现有的相网格对齐方法符合先进光刻技术的要求,但正在寻找替代方法.

研究的目的:

提出和验证用于高精度晶圆对齐的替代光学测量方案.
开发一种快速,高精度的晶圆对齐技术.
探索束干涉测量的潜力,用于石版应用.

主要方法:

使用束干涉测量来将格子衍射顺序转换为束.
采用基于干扰模式旋转的位移到角度转换机制.
建立一个理论模型并进行实验验证.

主要成果:

证明了横向位移和干扰模式旋转之间的线性关系 (R2 > 0.999 在 1 μm 上).
实现了比1.8nm更好的测量可重复性.
在实验室条件下验证了束干扰测量方案的性能.

结论:

束干涉度提供了一个精确的解决方案,用于在晶圆对齐中的实时位置传感.
拟议的方法具有显著的潜力,可以提高DUV和EUV石版的覆盖精度.
这种技术为现有的阶段格对齐系统提供了可行的替代方案.

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