Jiale Li1, Wen Liu1, Yiyi Wei1

  • 1Center of Electron Microscopy and State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China.

概括

一种新方法使用200°C的氧化 (NO) 处理,在上重新分散,恢复催化剂活性. 这种低温方法比氧气处理更有效,为催化剂再生提供了一个可持续的替代方案.