突破密集集成的极限:反向设计的酸尼多模光子电路
1School of Instrument Science and Opto-electronics Engineering, Hefei University of Technology, Hefei, China.
Nature communications
|December 20, 2025
概括
一种新的光子反向设计方法使薄膜酸光子集成电路的小型化成为可能. 这种方法可以实现组件的密集集成,为高容量数据通信铺平道路.
科学领域:
- 光子学 是一个光子学.
- 材料科学 材料科学 材料科学
- 集成光学 集成光学 集成光学
背景情况:
- 薄膜酸 (TFLN) 是光子集成电路 (PIC) 的一个有前途的材料.
- 挑战包括中度折射率,CMOS不兼容性和材料异质性,阻碍密集集成.
- 实现与光子学相似的密集集成,同时保持TFLN的优越性质是关键目标.
研究的目的:
- 开发一种光子反向设计方法,用于缩小TFLN PIC组件.
- 为了证明基于TFLN的光子电路密集集成的可行性.
- 使用小型化的TFLN设备实现高容量数据通信.
主要方法:
- 对TFLN应用的光子反向设计方法.
- 超紧元件的实验制造:模式划分 (解) 复合器,多模式波导交叉点和波导曲点.
- 构建多模光子电路,并与电光调节器集成.
主要成果:
- 经过证明的超紧组件:模式划分 (de) 复合器 (19×25μm2),波导交叉 (15×15μm2) 和30μm曲半径.
- 在0.06mm2芯片面积内实现了超过10个波导元件的密集集成.
- 通过多模式信号传输,以每通道120 Gbps的高速数据调制.
结论:
- 光子反向设计显著提高了TFLN PIC的集成密度.
- 这一进步促进了紧,高容量的光通信系统的发展.
- 该方法预计将TFLN被动组件面积密度增加十倍.
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