Zhenxin Huang1,2, Zenghui Yang1,2, Aijun Zeng3,4

  • 1Department of Advanced Optical and Microelectronic Equipment, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, 201800, China.

Scientific reports
|December 21, 2025
PubMed
概括

一个新的算法优化了微镜阵列 (MMA) 用于沉浸式光刻,改善了用于先进半导体制造的能量平衡和极化控制. 这提高了40nm以下节点的成像性能.