广

Guobin Mao1, Wen Yin2, Yeling Yang1

  • 1Materials Artificial Intelligence Center, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen, China.

概括

新型纳米点 (DAG-Si Ds) 显示出强大的,广泛的抗菌活性,耐药性风险低. 这些纳米材料破坏细菌膜和DNA,帮助伤口愈合和组织修复,毒性最小.