Jove
Visualize
联系我们
JoVE
x logofacebook logolinkedin logoyoutube logo
关于 JoVE
概览领导团队博客JoVE 帮助中心
作者
出版流程编辑委员会范围与政策同行评审常见问题投稿
图书馆员
用户评价订阅访问资源图书馆顾问委员会常见问题
研究
JoVE JournalMethods CollectionsJoVE Encyclopedia of Experiments存档
教育
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab Manual教师资源中心教师网站
使用条款与条件
隐私政策
政策

相关概念视频

Characteristics of MOSFET01:17

Characteristics of MOSFET

860
Metal-oxide-semiconductor field-effect Transistors, or MOSFETs, play a critical role in electronic circuits. They are primarily utilized for amplifying and switching signals.
Various vital parameters influence their functionality, which is crucial for theory and electronics applications. First, channel dimensions, precisely length, and width, are pivotal. The size of these channels affects the transistor's ability to carry current and switching speeds; shorter channels typically enable...
860
MOSFET: Depletion Mode01:20

MOSFET: Depletion Mode

785
Depletion-mode MOSFETs represent a unique subset of MOSFET technology, functioning fundamentally differently from their enhancement-mode counterparts. Unlike enhancement MOSFETs, which require a positive gate-source voltage (Vgs) to turn on, depletion-mode MOSFETs are inherently conductive and "normally on" devices.
The primary characteristic of depletion-mode MOSFETs is their ability to conduct current between the drain and source terminals without gate bias. This inherent conductivity...
785
MOSFET: Enhancement Mode01:22

MOSFET: Enhancement Mode

739
Enhancement-mode MOSFETs are pivotal components in electronics, distinguished by their capacity to act as highly efficient switches. They are part of the larger family of metal-oxide Semiconductor Field-Effect Transistors (MOSFETs). They are available in two types: p-channel and n-channel, each tailored to specific polarity operations.
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
739
Metal-Semiconductor Junctions01:24

Metal-Semiconductor Junctions

859
The contact of metal and semiconductor can lead to the formation of a junction with either Schottky or Ohmic behavior.
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
859
Biasing of Metal-Semiconductor Junctions01:27

Biasing of Metal-Semiconductor Junctions

511
Biasing metal-semiconductor junctions involves applying a voltage across the junction. Specifically, the metal is connected to a voltage source, while the semiconductor is grounded. This technique is essential for controlling the direction and magnitude of current flow in electronic devices, including diodes, transistors, and photovoltaic cells.
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
511
MOS Capacitor01:25

MOS Capacitor

1.4K
A Metal-Oxide-Semiconductor (MOS) capacitor is a fundamental structure used extensively in semiconductor device technology, particularly in the fabrication of integrated circuits and MOSFETs (metal-oxide-semiconductor field-effect transistors). The MOS capacitor consists of three layers: a metal gate, a dielectric oxide, and a semiconductor substrate.
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
1.4K

您也可能阅读

相关文章

通过共同作者、期刊和引用图与本文相关的文章。

排序
Same author

Radiograph-Based Deep Learning Model to Support Finger Joint Selection for Ultrasound Examination in Rheumatoid Arthritis.

Diagnostics (Basel, Switzerland)·2026
Same author

Explainable Artificial Intelligence in Medical Imaging: Explanations That Make Sense to Humans.

AJR. American journal of roentgenology·2026
Same author

Tissue-Adaptive, Adhesive, and Ultra-Conformal Polymer Nanomesh-Based Implantable Bioelectrode for Long-Term Stable Electrical Stimulation.

Advanced healthcare materials·2026
Same author

Improving non-expert performance in musculoskeletal MRI protocoling through a large language model.

Scientific reports·2026
Same author

Synthesis of Cubic Ni<sub>3</sub>Sn Bimetallic Nanoparticles as a New Polymorph by Sequential Exsolution.

Advanced materials (Deerfield Beach, Fla.)·2026
Same author

Hybrid MBE Route to Adsorption-Controlled Growth of BaTiO<sub>3</sub> Membranes with Robust Polarization Switching.

Nano letters·2025

相关实验视频

Updated: Jan 7, 2026

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating
10:36

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating

Published on: April 12, 2018

11.9K

在应变等级的Mott设备中切换透限制值.

Utaek Cho1,2,3, Dong Kyu Lee1,2,4, Sungwon Lee1,2,3

  • 1Department of Materials Science and Engineering, Seoul National University, Seoul 08826, Republic of Korea.

ACS nano
|December 30, 2025
PubMed
概括

在纳米岛上的压力分级二氧化 (VO2) 降低了核化障碍,从而实现更快,更节能的值切换. 这促进了透限制的切换,使得设备运行超快.

关键词:
这是一个Mott开关.金属绝缘体过渡 过渡神经元神经元是一个神经元.应变梯度的变化趋势氧化瓦纳的氧化物

更多相关视频

Scalable Quantum Integrated Circuits on Superconducting Two-Dimensional Electron Gas Platform
05:39

Scalable Quantum Integrated Circuits on Superconducting Two-Dimensional Electron Gas Platform

Published on: August 2, 2019

10.2K
Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping
14:58

Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping

Published on: June 3, 2015

15.3K

相关实验视频

Last Updated: Jan 7, 2026

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating
10:36

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating

Published on: April 12, 2018

11.9K
Scalable Quantum Integrated Circuits on Superconducting Two-Dimensional Electron Gas Platform
05:39

Scalable Quantum Integrated Circuits on Superconducting Two-Dimensional Electron Gas Platform

Published on: August 2, 2019

10.2K
Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping
14:58

Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping

Published on: June 3, 2015

15.3K

科学领域:

  • 材料科学 材料科学 材料科学
  • 凝聚物质物理学 凝聚物质物理学
  • 设备工程 设备工程

背景情况:

  • 二氧化物 (VO2) 呈现出一个场驱动的绝缘体到金属的转换,对于新兴设备的值切换至关重要.
  • VO2的第一阶段过渡的内在核化障碍导致时间延迟,阻碍了节能运行.

研究的目的:

  • 为了在纳米岛 (NIs) 上展示应变分级的VO2,以提高值切换.
  • 促进核化和减少化时间,以实现更快,更节能的设备性能.

主要方法:

  • 在Pt NIs上制造应变等级的VO2皮层.
  • 分析电压触发的相位转换和核化动态.
  • 压力分布的特征及其对激活能量的影响.

主要成果:

  • Pt NIs 在本地破坏格子连贯性,促进不合适的应变能量放松.
  • 应变等级的VO2降低了核化屏障,与持续应变的薄膜相比,将化时间 (τinc) 减少了20倍.
  • 透限制切换稳定了转移稳定阶段,使强大的负差电阻和自我振荡行为成为可能.

结论:

  • 通过Pt NIs在VO2中的应变工程有效地调整了相位过渡动态.
  • 这种方法实现了超快速和高能效的切换,克服了内在核化障碍的局限性.
  • 这些发现为先进的高性能电子设备铺平了道路.