4H-SiC MOSFET中的功率定律时间指数和时间到故障:4H-SiC MOSFET:超越固定反应-扩散理论
Mamta Dhyani1, Smriti Singh1, Nir Tzhayek1
1Department of Electrical and Electronic Engineering, Ariel University, Ariel 40700, Israel.
Micromachines
|December 31, 2025
概括
碳化 (SiC) MOSFET中的偏差温度不稳定性 (BTI) 与模型有所不同. 一个新的现场驱动框架改善了SiC功率转换器的可靠性预测.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 半导体物理 半导体物理
背景情况:
- 偏差-温度不稳定性 (BTI) 是功率半导体设备的一个关键可靠性问题.
- 对于而言建立的经典反应-扩散模型,通常被假定是SiC设备.
研究的目的:
- 在现实的操作条件下,研究1700V 4H-SiC MOSFET中的BTI机制.
- 确定传统BTI模型对SiC技术的适用性.
- 为SiC设备开发一个改进的可靠性预测框架.
主要方法:
- 使用了1700V 4H-SiC MOSFET,经过1MHz的切换,同时进行门和排水应力.
- 进行了值电压测量以量化降解.
- 进行了取决于温度的应力测试,以分析激活能量.
主要成果:
- 观察到BTI降解偏离了SiC的经典反应-扩散行为.
- 在高负门偏差下确定了一种现场驱动的陷生成机制.
- 测量了负激活能量 (-0.466 eV),表明在较低温度下加速降解.
结论:
- 传统的BTI模型对于SiC技术是不够的.
- 固定功率定律指数寿命推算导致了显著的预测错误.
- 拟议的偏差依赖,现场驱动的框架为SiC转换器提供了更准确的可靠性评估.
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