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使用PTFE和DLC对CMP组件进行湿度控制的疏水涂层,以减轻泥积聚和污染

Eunseok Lee1, Kyoungjun Sun2, Yuhan So2

  • 1Semiconductor Research Center, Research Line Technology Team, Samsung Electronics Co., Ltd., Hwaseong-si 18448, Republic of Korea.

Micromachines
|December 31, 2025
PubMed
概括

像PTFE和DLC这样的疏水涂层通过减少泥污染和划痕,显著改善了半导体制造中的化学机械抛光 (CMP). 这些表面修改提高了工艺的可靠性,并延长了设备的寿命.

关键词:
在CMP中,使用CMP是很重要的.防水涂层是一种防水涂层.可靠性的可靠性污染污泥污染污染污泥污染污染污泥污染污泥污染污泥污染污泥污染污泥污染污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥污泥超水性是一种超水性.

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