Jove
Visualize
联系我们
JoVE
x logofacebook logolinkedin logoyoutube logo
关于 JoVE
概览领导团队博客JoVE 帮助中心
作者
出版流程编辑委员会范围与政策同行评审常见问题投稿
图书馆员
用户评价订阅访问资源图书馆顾问委员会常见问题
研究
JoVE JournalMethods CollectionsJoVE Encyclopedia of Experiments存档
教育
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab Manual教师资源中心教师网站
使用条款与条件
隐私政策
政策

相关概念视频

UV–Vis Spectrometers01:14

UV–Vis Spectrometers

4.0K
The absorbance of UV and visible (UV–visible) radiations is measured using a UV–visible spectrophotometer. Deuterium lamps, which emit UV radiation, and tungsten lamps, which produce radiation in the visible region, are used as light sources in UV–visible spectrophotometers. A monochromator or prism is used for diffraction grating, i.e., to split the incoming radiation into different wavelengths. A system of slits is used to focus the desired wavelength on the sample cell.
4.0K
Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

1.1K
Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used....
1.1K
Atomic Emission Spectroscopy: Lab01:29

Atomic Emission Spectroscopy: Lab

873
AES is a powerful analytical technique, especially effective when used with plasma sources, producing abundant spectra in characteristic emission lines. The Inductively Coupled Plasma (ICP), in particular, yields superior quantitative analytical data due to its high stability, low noise, low background, and minimal interferences under optimal experimental conditions. However, newer air-operated microwave sources are emerging as promising alternatives that could be more cost-effective than...
873

您也可能阅读

相关文章

通过共同作者、期刊和引用图与本文相关的文章。

排序
Same author

Superhydrophilic and Superhydrophobic Surfaces with Reversible Wettability Using Laser Processing.

ACS omega·2026
Same author

A High Spatial and Depth Resolution Deep-UV 266 nm Wavelength Laser-Based Integrated LIBS, Fluorescence, and Raman System for Probing Lunar and Planetary Simulants and Geological Materials.

ACS omega·2025
Same author

Mixture Detection Using a Deep-UV Raman-LIBS Autofocus-Based Compact Chemical Spectroscopic Sensor.

ACS omega·2025
Same author

Gold Metal Recovery from Electronic Waste through Laser Generation of Micro and Nanoparticles.

ACS omega·2025
Same author

Superhydrophobic Surface by Laser Ablation of PDMS.

Langmuir : the ACS journal of surfaces and colloids·2023
Same author

Laser Annealing of TiO<sub>2</sub> Electron-Transporting Layer in Perovskite Solar Cells.

ACS applied materials & interfaces·2018

相关实验视频

Updated: May 3, 2026

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
08:48

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

Published on: November 9, 2015

8.6K

使用深紫外线LIBS的光电子设备的纳米级深度分析.

Atchutananda Surampudi1, Mool C Gupta1

  • 1Charles L. Brown Department of Electrical & Computing Engineering, University of Virginia, Charlottesville, Virginia 22904, United States.

ACS omega
|January 8, 2026
PubMed
概括

深紫外激光诱导分解光谱 (LIBS) 实现了在10snm的纳米级元素深度分析. 这种便携式方法为薄膜和半导体设备的实时分析提供了高灵敏度.

科学领域:

  • 材料科学 材料科学 材料科学
  • 分析化学 分析化学
  • 频谱学是一种光谱学.

背景情况:

  • 精确的元素纳米级深度分析对于半导体接口和光学涂层等先进材料至关重要.
  • 二级离子质谱 (SIMS) 提供纳米级深度分析,但缺乏可移植性和实时监测能力.
  • 激光诱导分解光谱 (LIBS) 提供了敏感的元素检测,但通常具有有限的深度分辨率 (~μm).

研究的目的:

  • 在环境条件下使用深紫外线LIBS进行纳米级元素深度分析.
  • 开发一个紧的,便携式的LIBS仪器,用于实时表征.
  • 为了实现高深度分辨率 (~10s的nm) 与百万分之一的基本灵敏度.

主要方法:

  • 使用光纤合的266nm (UV-C) 脉冲激光器进行深紫外线LIBS.
  • 每次脉冲达到~20-25nm的精确除深度.
  • 开发了一个紧的光学头 (3 × 2 × 1.5 cm3) 具有自动对焦和定制球形镜头.

主要成果:

  • 证明了纳米级深度分析,分辨率为10snm.
  • 实现了百万分之一的基本检测灵敏度.
  • 在光伏设备 (~650 nm),介电镜中的交替Ta2O5/SiO2层 (~100-145 nm) 和上的~1-2 nm原生氧化物中成功配置了补剂.

更多相关视频

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
13:49

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes

Published on: January 19, 2020

7.1K
Nanoscale Characterization of Liquid-Solid Interfaces by Coupling Cryo-Focused Ion Beam Milling with Scanning Electron Microscopy and Spectroscopy
11:03

Nanoscale Characterization of Liquid-Solid Interfaces by Coupling Cryo-Focused Ion Beam Milling with Scanning Electron Microscopy and Spectroscopy

Published on: July 14, 2022

4.0K

相关实验视频

Last Updated: May 3, 2026

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
08:48

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

Published on: November 9, 2015

8.6K
Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
13:49

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes

Published on: January 19, 2020

7.1K
Nanoscale Characterization of Liquid-Solid Interfaces by Coupling Cryo-Focused Ion Beam Milling with Scanning Electron Microscopy and Spectroscopy
11:03

Nanoscale Characterization of Liquid-Solid Interfaces by Coupling Cryo-Focused Ion Beam Milling with Scanning Electron Microscopy and Spectroscopy

Published on: July 14, 2022

4.0K

结论:

  • 深紫外线LIBS在环境条件下实现了高分辨率的纳米级元素深度分析.
  • 开发的紧型LIBS仪器适用于光学和电子设备的实时,便携式表征.
  • 这种技术消除了真空或大量样品准备的需要,为传统方法提供了有吸引力的替代方案.