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使用深紫外线LIBS的光电子设备的纳米级深度分析

Atchutananda Surampudi¹, Mool C Gupta¹

¹Charles L. Brown Department of Electrical & Computing Engineering, University of Virginia, Charlottesville, Virginia 22904, United States.

|January 8, 2026

概括

深紫外激光诱导分解光谱 (LIBS) 实现了在10snm的纳米级元素深度分析. 这种便携式方法为薄膜和半导体设备的实时分析提供了高灵敏度.

科学领域:

材料科学材料科学材料科学
分析化学分析化学
频谱学是一种光谱学.

背景情况:

精确的元素纳米级深度分析对于半导体接口和光学涂层等先进材料至关重要.
二级离子质谱 (SIMS) 提供纳米级深度分析,但缺乏可移植性和实时监测能力.
激光诱导分解光谱 (LIBS) 提供了敏感的元素检测,但通常具有有限的深度分辨率 (~μm).

研究的目的:

在环境条件下使用深紫外线LIBS进行纳米级元素深度分析.
开发一个紧的,便携式的LIBS仪器,用于实时表征.
为了实现高深度分辨率 (~10s的nm) 与百万分之一的基本灵敏度.

主要方法:

使用光纤合的266nm (UV-C) 脉冲激光器进行深紫外线LIBS.
每次脉冲达到~20-25nm的精确除深度.
开发了一个紧的光学头 (3 × 2 × 1.5 cm3) 具有自动对焦和定制球形镜头.

主要成果:

证明了纳米级深度分析,分辨率为10snm.
实现了百万分之一的基本检测灵敏度.
在光伏设备 (~650 nm),介电镜中的交替Ta2O5/SiO2层 (~100-145 nm) 和上的~1-2 nm原生氧化物中成功配置了补剂.

结论:

深紫外线LIBS在环境条件下实现了高分辨率的纳米级元素深度分析.
开发的紧型LIBS仪器适用于光学和电子设备的实时,便携式表征.
这种技术消除了真空或大量样品准备的需要,为传统方法提供了有吸引力的替代方案.

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