接近零的歇斯底里范德瓦尔斯MnAl2S4场效应晶体管具有低最小值电压降解和高热稳定性
Seyed Mehdi Sattari-Esfahlan1, Yury Illarionov2, Fang Xu3
1Institute for Microelectronics (TU Wien), Vienna, Austria.
概括
这项研究介绍了MnAl2S4作为二维半导体场效应晶体管 (FET) 的新范德瓦尔斯介电器. 这种新材料具有出色的电性能和高可靠性,这对于先进的电子设备至关重要.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 固态物理 固态物理
背景情况:
- 将超薄的范德瓦尔斯 (vdW) 介电材料与二维半导体集成,对于开发超级规模的场效应晶体管 (FET) 是必不可少的.
- 现有的VDW介电材料在实现高级半导体应用的高质量和可靠性方面面临挑战.
研究的目的:
- 为了研究层状方体MnAl2S4作为MoS2基FET的新型VDW介电体的潜力.
- 综合评估使用MnAl2S4作为门绝缘体的FET的电性能和可靠性.
主要方法:
- 在顶端门 (TG) 和底端门 (BT) 两种配置中制造基于MoS2的FET.
- 电气表征包括门泄漏,歇斯底里和偏移温度不稳定性 (BTI) 测量.
- 对MnAl2S4和MoS2.2之间的VDW接口质量的分析.
主要成果:
- 设备在高电场下 (高达11 MV cm-1) 显示出出色的电性能,门泄漏率低,歇斯底里极小 (<2 mV).
- 观察到异常的BTI和逆时钟方向歇斯底里,可能与MnAl2S4.4中的Mn间位和S空缺有关.
- 在高温和可重现的hysteresis动态下,证明了微不足道的门电压降解,表明了设备的高可靠性.
结论:
- 层状方体 MnAl2S4 是可靠的 2D 半导体设备的有希望的 vdW 介电体.
- MnAl2S4的高质量的VDW接口和缺陷特性有助于制造的FET的出色性能和稳定性.
- 对MnAl2S4中缺陷缓解的进一步研究可能会提高其适用于下一代电子产品的适用性.
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