相关实验视频
Updated: Jan 17, 2026

10:17
20 mJ, 1 ps Yb:YAG Thin-disk Regenerative Amplifier
Published on: July 12, 2017
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概括
我们开发了一种新型的氧化 (Er3+:Ta2O5) 波导放大器. 该设备展示了高增益和输出功率,显示了集成光子系统的前景.
科学领域:
- 光子学和光学工程的工程.
- 材料科学 材料科学 材料科学
- 集成光学 集成光学 集成光学
背景情况:
- 用添加的材料对于光学放大器至关重要.
- 氧化 (Ta2O5) 为光学增益提供了一个有希望的宿主,但存在制造方面的挑战.
- 高功率集成设备需要大模式区域 (LMA) 波导.
研究的目的:
- 制造和描述一个高性能Er3+:Ta2O5LMA波导放大器.
- 为了克服与Er3+相关的制造挑战:Ta2O5材料.
- 为了证明这种放大器在紧,高输出和低噪音的芯片内光学放大功能的潜力.
主要方法:
- Er3+的制造: Ta2O5波导放大器使用直接蚀刻.
- 化过程以减少传播损失.
- 光学表征包括增益,输出功率和噪声数字测量.
主要成果:
- 实现了强大的光学封闭和高信号重叠 (>98.6%).
- 在C频段中,已经证明了高的芯片信号增强 (高达38.1dB) 和净增益 (高达9.6dB).
- 确认稳定的高功率运行,最大输出功率为2.4mW,最小噪声值为5.68dB.
结论:
- 开发的Er3+:Ta2O5LMA波导放大器克服了制造方面的挑战,并验证了放大潜力.
- 该设备表现出极好的大信号放大性能.
- 这项技术对集成光子系统中的紧,高输出和低噪音的芯片内光学放大具有重大前景.
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