有机素碳酸盐的依赖于连接体功能性能的表现抵抗着
Xiaofei Liu1,2, Tianren Liu1,3, Kaixin Su1
1State Key Laboratory of Optical Field Manipulation Science and Technology, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China.
研究人员开发了新的有机碳酸盐,用于高分辨率的光刻画. 这些材料提供90纳米分辨率,并通过控制光化学机制,具有蚀刻持久深紫外线 (DUV) 阻抗的潜力.
科学领域:
- 材料科学 材料科学 材料科学
- 化学 化学 化学
- 纳米技术纳米技术
背景情况:
- 含有金属的电阻对于高分辨率光刻画至关重要.
- 了解光化学机制,特别是联结体效应,对于抵抗的发展至关重要.
研究的目的:
- 设计和合成新的有机素碳酸盐作为深紫外线 (DUV) 抵抗剂.
- 为了研究在DUV光刻中连接体功能和光化学机制之间的关系.
- 为了评估所开发的电阻的光刻性能和蚀刻耐久性.
主要方法:
- 合成一对受控的有机碳酸盐,具有不同的功能组.
- 石版评价,包括分辨率测试 (90纳米半调) 和在硬面罩层上的图案转移.
- 光谱和化学表征以阐明光化学反应途径.
主要成果:
- 两种合成的有机碳酸盐抗体都实现了90nm半音调分辨率.
- 证明了成功地将图案转移到碳基硬面膜层上.
- 提出了两种具有竞争力的光化学反应途径,涉及烯酸组,影响了光刻灵敏度和溶解对比度.
结论:
- 有机素碳酸盐的结构性可调性允许对光化学机制进行控制.
- 这些材料显示出作为高分辨率和耐蚀性DUV电阻的前景.
- 连接体设计是优化先进光刻的阻力性能的一个关键因素.
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